Positive dye photoresist compositions with 2,4-bis(phenylazo)res

Details Positive dye photoresist compositions with 2,4-bis(phenylazo)res Positive dye photoresist compositions with 2,4-bis(phenylazo)res

1988-06-06

1991-01-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430166, 430192, 430193, 430311, 430326, 430270, G03F 7022, G03C 161

Patent

active

049834924

ABSTRACT:
This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye.

REFERENCES:
patent: 4575480 (1986-03-01), Kotani et al.
patent: 4594306 (1986-06-01), Stahlhofen et al.
patent: 4618565 (1986-10-01), White et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4828960 (1989-05-01), Hertog
patent: 4882260 (1989-11-01), Kohara et al.

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