Positive diazo quinone photoresist compositions containing antih

Details Positive diazo quinone photoresist compositions containing antih Positive diazo quinone photoresist compositions containing antih

1991-04-25

1994-08-02

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430510, G03F 7023, G03C 161

Patent

active

053344812

ABSTRACT:
Addition of compounds of formula I ##STR1## in which R.sup.1 to R.sup.4 are each hydroxyl or C.sub.1-6 -alkoxy and R.sup.5 to R.sup.10 are each hydrogen or C.sub.1-6 -alkyl,
to positive photoresist compositions based on a diazoquinone
ovolak resin effectively suppresses stray radiation and halation effects in corresponding photoresist coatings, in particular if these coatings have been applied to highly reflective substrates.

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patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4376162 (1983-03-01), Kawata et al.
patent: 4414314 (1983-11-01), Kaplan et al.
patent: 4575480 (1986-03-01), Kotani et al.
patent: 4618565 (1986-10-01), White et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4910122 (1990-03-01), Arnold et al.
Elliott, D. J., Integrated Circuit Fabrication Technology, 1982, pp. 186-188.
Cernigliaro, G. J., et al., "Dissolution Rate . . . Positive Photoresists", SPIE vol. 1086 Advances in Resist Tech. & Proc. (VI) (1989) pp. 106-116.
Renschler, C. L. et al., "Dyed Positive Photoresist Employing Curcumin for Notching Control", J. Electrochem. Soc., vol. 136, No. 1, Jan. 1989, pp. 281-283.

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