Positive developing method and apparatus

Details Positive developing method and apparatus Positive developing method and apparatus

1978-05-23

1980-04-08

Hix, L. T.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

354325, 134 95, 134 99, 134140, 134153, 134199, B08B 302

Patent

active

041970004

ABSTRACT:
A positive developer and method spraying developer solution against rotating wafers stacked along rotation axis to remove photoresist and recycling the developer solution in successive cycles and batches of wafers being processed; adding small quantities of fresh developer solution in each cycle of operation to replace the small quantity lost and rinsed down the drain at the end of each cycle, thereby maintaining the strength of the developer solution and equilibrium to establish a predetermined time per cycle needed for completing removal of photoresist; rinsing away the developer solution from the wafers and interior of the spray chamber with deionized water and subsequently applying heated nitrogen to accomplish drying of everything within the chamber.

REFERENCES:
patent: 3489608 (1970-01-01), Jacobs et al.
patent: 3604331 (1971-09-01), Parlin et al.
patent: 3769992 (1973-11-01), Wallestad
patent: 3812514 (1974-05-01), Watabe
patent: 3846818 (1974-11-01), Merz
patent: 3911460 (1975-10-01), Lasky et al.
patent: 3923156 (1975-12-01), Wallestad
patent: 3961877 (1976-06-01), Johnson
patent: 3973847 (1976-08-01), Gygax et al.
patent: 3990088 (1976-11-01), Takita
patent: 3990462 (1976-11-01), Elftmann et al.
patent: 4027686 (1977-06-01), Shortes et al.
patent: 4081816 (1978-03-01), Geyken et al.

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