Positive- and negative-working resist compositions with acid gen

Details Positive- and negative-working resist compositions with acid gen Positive- and negative-working resist compositions with acid gen

1982-08-23

1985-01-01

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430270, 430280, 430281, 430285, 430286, 430325, 430326, 430908, 430910, 430914, G03C 160, G03C 168

Patent

active

044916280

ABSTRACT:
Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in polarity (solubility) together with a photoinitiator which generates acid upon radiolysis. A sensitizer component that alters wavelength sensitivity may also be added.

REFERENCES:
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patent: 3536489 (1970-10-01), Smith
patent: 3779778 (1973-12-01), Smith et al.
patent: 3859099 (1975-01-01), Petropoulos et al.
patent: 3984253 (1976-10-01), Nelson
patent: 4104070 (1978-08-01), Moritz et al.
patent: 4193799 (1980-03-01), Crivello
patent: 4210449 (1980-07-01), Schlesinger et al.
patent: 4250053 (1981-02-01), Smith
patent: 4273668 (1981-06-01), Crivello
patent: 4311782 (1982-01-01), Buhr et al.
patent: 4405708 (1983-09-01), Van Pelt et al.

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