Positive acting resist material comprised of novoloc resin deriv

Details Positive acting resist material comprised of novoloc resin deriv Positive acting resist material comprised of novoloc resin deriv

1985-09-25

1987-09-01

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430270, 430326, G03C 152, G03C 1495

Patent

active

046908820

ABSTRACT:
A mixture of an alkali soluble resin and either a quinonediazide compound or poly(2-methylpentene-1-sulfone provides a positive acting resist material, which is very high in a critical exposure dose at which the resist begins to gel by radiation-induced crosslinking. By using this resist material in direct delineation of patterns with ionizing radiation, the problem of gelling of the resist film in the areas repeatedly scanned for the detection of the alignment marks is obviated. A novolac resin comprising a t-butylphenol or phenylphenol segment is suitable as the alkali soluble resin.

REFERENCES:
patent: 3526503 (1970-10-01), Dunham et al.
patent: 4123279 (1978-10-01), Kobayashi
patent: 4173470 (1979-11-01), Fahrenholtz et al.
patent: 4289845 (1981-09-01), Bowden et al.
patent: 4308368 (1981-12-01), Kubo et al.

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