Positive acting photoresist comprising diazide ester, novolak re

Details Positive acting photoresist comprising diazide ester, novolak re Positive acting photoresist comprising diazide ester, novolak re

1976-07-22

1979-04-10

Welsh, John D.

Gas separation: apparatus

Electric field separation apparatus

Electrode retaining or supporting means

96115R, 96 351, 260 25, G03C 154

Patent

active

041486544

ABSTRACT:
Rosinous material is added to photoresist compositions to improve flexiblity, rheology and other physical properties. The rosinous material may be a rosin or a hydrogenated, esterified or neutralized derivative of a rosin. Particular advantages are achieved when the photoresists also contain a polyvinyl alkyl ether.

REFERENCES:
patent: 2760863 (1956-08-01), Plambeck, Jr.
patent: 3025162 (1962-03-01), Gilbert
patent: 3402044 (1968-09-01), Steinhoff
patent: 3634082 (1972-01-01), Christensen
patent: 3650754 (1972-03-01), Jones
patent: 3713831 (1973-01-01), Hayes et al.
Chemical Abstracts, vol. 61, col. 5130b (1964).
Encyclopedia of Polymer Science and Technology, vol. 12, pp. 146, 147, 152, 153, 154.

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