Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1979-07-27
1981-01-27
Louie, Jr., Won H.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430170, 430271, 430275, 430280, 430278, 430906, G03C 168, G03C 152
Patent
active
042476160
ABSTRACT:
A positive-acting light-sensitive composition having excellent utility as a photoresist, comprising: (a) a crosslinked urethane resin formed by a catalyzed crosslinking of a non-heat reactive novalac phenolic resin and a polyisocyanate compound; (b) an epoxy resin having an epoxide equivalent weight of less than about 400 and a curing agent therefor; and (c) a positive-acting photosensitizer.
Upon applying to a substrate and drying, the epoxy resin cures, resulting in a film useful as a photoresist or in the formation of lithographic printing plates.
REFERENCES:
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patent: 3660097 (1972-05-01), Mainthia
patent: 3890152 (1975-06-01), Ruckert et al.
patent: 3900325 (1975-08-01), Christensen et al.
patent: 3956043 (1976-05-01), Zahir et al.
patent: 4148654 (1979-04-01), Oddi
patent: 4148655 (1979-04-01), Itoh et al.
Presley Richard M.
Vikesland John P.
Alexander Cruzan
Litman Mark A.
Louie, Jr. Won H.
Minnesota Mining and Manufacturing Company
Sell Donald M.
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