Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2006-05-16
2006-05-16
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
07046361
ABSTRACT:
An alignment system for aligning two elements includes an alignment target with periodic patterns on each element. The alignment target includes two locations, at least one of which has a designed in offset. If desired, both locations may have designed in offsets of the same magnitude but in opposite directions. The diffraction patterns produced at the two locations are compared. If the difference between the patterns is at a minimum, the elements are properly aligned. When an alignment error is introduced, however, the calculated difference can be used to determine the error. In another embodiment, bands in the moiré fringes from the different locations may be compared to determine the alignment error. The two elements may then be moved relative to each other to minimize the alignment error. Thus, the alignment target may advantageously be used in any alignment system, such as an exposure tool.
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Heaton John D.
Lowe-Webb Roger R.
Yang Weidong
Nanometrics Incorporated
Silicon Valley Patent & Group LLP
Stock, Jr. Gordon J.
Toatley , Jr. Gregory J.
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