Positioning system for use in lithographic apparatus

Details Positioning system for use in lithographic apparatus Positioning system for use in lithographic apparatus

2005-02-08

2005-02-08

Lee, John R. (Department: 2881)

Radiant energy

Means to align or position an object relative to a source or...

C250S492300, C355S053000, C269S073000

Reexamination Certificate

active

06852989

ABSTRACT:
A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.

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