Positioning method and positioning mechanism for use in exposure

Details Positioning method and positioning mechanism for use in exposure Positioning method and positioning mechanism for use in exposure

1991-09-10

1993-07-06

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01N 2186

Patent

active

052256863

ABSTRACT:
An alignment detecting method in which alignment detection for a mask and a wafer is effected by using an alignment beam projected from an alignment unit. According to this method, the attitude of the alignment unit is detected and an angle of projection of the alignment beam is adjusted o the basis of the attitude detection. Then, alignment detection for the mask and t he wafer is effected by using the angle-adjusted alignment beam.

REFERENCES:
patent: 4171162 (1979-10-01), Gerard et al.
patent: 4902900 (1990-02-01), Kamiya et al.
patent: 4999669 (1991-03-01), Sakamoto et al.
patent: 5011282 (1991-04-01), Ream et al.

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