Positioning apparatus and process system having the same

Details Positioning apparatus and process system having the same Positioning apparatus and process system having the same

1996-03-19

1998-04-14

Voeltz, Emanuel T.

Boots, shoes, and leggings

414331, 414225, 414783, 356372, 356373, 356376, B65H 100, G01B 1124

Patent

active

057400342

ABSTRACT:
A semiconductor wafer positioner including a rotating table on which a wafer is placed and a peripheral shape of the wafer is optically detected as a first peripheral shape signal. A control section combines two half cycle components of the first peripheral shape signal, the components being 180.degree. out of phase, to obtain a second peripheral shape signal exhibiting a characteristic feature of flat orientation. A peak in the second peripheral shape signal is detected, and data in the first peripheral shape signal corresponding to the peak and 180.degree. from the peak is invalidated. A curve approximation is utilized to approximate the invalidated data to produce a third peripheral shape signal from which an eccentricity amount and direction are calculated.

REFERENCES:
patent: 4752898 (1988-06-01), Koenig
patent: 4836733 (1989-06-01), Hertel et al.
patent: 4880348 (1989-11-01), Baker et al.
patent: 5194743 (1993-03-01), Aoyama et al.
patent: 5202842 (1993-04-01), Suzuki
patent: 5239182 (1993-08-01), Tateyama et al.
patent: 5289263 (1994-02-01), Kiyokawa et al.
patent: 5493403 (1996-02-01), Nishi

Affiliated with

Also associated with

Rating

Positioning apparatus and process system having the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positioning apparatus and process system having the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positioning apparatus and process system having the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-641858