Positioning apparatus and photolithography apparatus...

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

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Reexamination Certificate

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11157781

ABSTRACT:
A positioning apparatus includes first and second stages, a pair of first mirrors having reflective surfaces disposed on the first stage at an acute angle with a vertical axis, a pair of second mirrors disposed on the second stage and having reflective surfaces orthogonal to the vertical axis, a reference structure functioning as a reference for measuring the vertical position of the second stage, a pair of third mirrors disposed on the reference structure and having reflective surfaces orthogonal to the vertical axis, and a pair of interferometers for measuring the vertical position of the second stage using the first, second, and third mirrors.

REFERENCES:
patent: 6069683 (2000-05-01), Iwamoto
patent: 6160628 (2000-12-01), Inoue
patent: 6285457 (2001-09-01), Ukaji
patent: 6414742 (2002-07-01), Korenaga et al.
patent: 6664619 (2003-12-01), Mitani et al.
patent: 6819433 (2004-11-01), Takai et al.
patent: 2005/0111005 (2005-05-01), Eussen et al.
patent: 11-190786 (1999-07-01), None
patent: 2001-143997 (2001-05-01), None
patent: 2003-123832 (2003-04-01), None
patent: 2002-0067658 (2002-08-01), None

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