Positioning apparatus and exposure apparatus using the same

Electrical generator or motor structure – Dynamoelectric – Linear

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318625, 318135, 74471XY, 33 1M, H01L 2100

Patent

active

060283769

ABSTRACT:
A positioning apparatus includes a movable stage, a first linear motor for moving the stage in a predetermined direction, a platform for supporting the first linear motor, and an inertial force application mechanism for applying a force for canceling a force acting on the platform, which is generated when the stage is moved by the first linear motor. The inertial force application mechanism includes amass body, a guide for supporting and guiding the mass body, a second linear motor for moving the mass body, and a controller for controlling the second linear motor. Since the inertial force application mechanism of the positioning apparatus prevents transmission of vibration generated by an increase in an exciting force of the stage, rapid and precise positioning can be performed.

REFERENCES:
patent: 5040431 (1991-08-01), Sakino et al.
patent: 5184055 (1993-02-01), Ohishi et al.
patent: 5229670 (1993-07-01), Kagawa
patent: 5280677 (1994-01-01), Kubo et al.
patent: 5338121 (1994-08-01), Kobayashi et al.
patent: 5382095 (1995-01-01), Akutsu
patent: 5524502 (1996-06-01), Osanai
patent: 5610686 (1997-03-01), Osanai
patent: 5701041 (1997-12-01), Akutsu et al.
patent: 5717482 (1998-02-01), Akutsu et al.
patent: 5726548 (1998-03-01), Chiba et al.

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