Positioning apparatus

Details Positioning apparatus Positioning apparatus

1983-03-07

1984-01-03

Punter, William H.

Optics: measuring and testing

By alignment in lateral direction

With light detector

356363, 356401, G01B 1100

Patent

active

044239599

ABSTRACT:
A positioning apparatus includes a projecting means for projecting plural coherent light beams onto an object to be aligned. The projecting means comprises plural converging means for forming each coherent light beam into a stripe-shaped beam extended in a direction substantially perpendicularly to the scanning direction of said scanning means, and each of said alignment marks comprises plural short line segments arranged in a stripe extended in a direction substantially perpendicular to the scanning direction of said scanning means and each inclined approximately by 45.degree. with respect to said scanning direction. Therefore, the alignment mark can be clearly identified from the circuit patterns by relatively rough preliminary alignment even if such mark is positioned in a narrow space between the chips for example for LSI.

REFERENCES:
patent: 3861798 (1975-01-01), Kobayashi et al.
patent: 4252442 (1981-02-01), Dandliker et al.
Khoury, H. A. "Analog Automatic Wafer Alignment for Fine Positioning", IBM Tech. Disc. Bull, 3-1975, p. 2895.
Trotel et al. "Optical Alignment System for Submicron X-Ray Lithography", J. Vac. Sci. Tech. 16(6), (Nov./Dec. 1979) pp. 1954-1958.

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