Position resolution of an interferometrially controlled moving s

Details Position resolution of an interferometrially controlled moving s Position resolution of an interferometrially controlled moving s

1996-04-03

1998-07-21

Turner, Samuel A.

Optics: measuring and testing

By polarized light examination

With birefringent element

356400, 2505593, G01B 902

Patent

active

057841667

ABSTRACT:
A method and apparatus for achieving high position resolution of a moving stage in a lithographic system utilized for the manufacture of semiconductor integrated circuits. A series of values of the stage position are measured using an interferometric system, and a present position of the stage is estimated using regression analysis applied to a selected number of the series of measured values. The resulting predicted position is of higher resolution than a single stage position measurement of the interferometric system.

REFERENCES:
patent: 4546355 (1985-10-01), Boles
patent: 5182615 (1993-01-01), Kurosawa et al.
Vanderkooy et al., "Resolution Below the Least Significant Bit in Digital Systems With Dither", J. Audio Eng. Soc., vol. 32, No. 3, Mar. 1984.

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