Position measuring apparatus utilizing two-beam interferences to

Details Position measuring apparatus utilizing two-beam interferences to Position measuring apparatus utilizing two-beam interferences to

1990-11-01

1992-06-09

McGraw, Vincent P.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

250237G, G01B 902

Patent

active

051201321

ABSTRACT:
A phase grating is provided in this length or angle measuring apparatus, which operates by interference. A beam striking the phase grating from a laser is diffracted into .+-.1st order beams at the phase grating. The diffracted .+-.1st order beams are reflected at retroreflecting elements and, diffracted once again at the phase grating, and made to interfere in pairs. The modulations in intensity of the two-beam interferences are converted by detectors into electrical signals that are phase-displaced from one another. The diffraction grating is configured such that at least one partial beam cluster of the zero order of diffraction is involved in the formation of at least one of the two-beam interferences.

REFERENCES:
patent: 3726595 (1973-04-01), Matsumoto
patent: 3738753 (1973-06-01), Huntley, Jr.
patent: 4629886 (1986-12-01), Akiyama et al.
patent: 4776701 (1988-10-01), Pettigrew
patent: 4792678 (1988-12-01), Spies
patent: 4970388 (1990-11-01), Nishimura et al.
Design Engineering, Feb. 1989, "Linear Encoder Matches Resolution of Laser Interferometer", pp. 14-15.
Philips Technisch Tijdschrift, 1989, "Nauwkeurige Digitale Verplaatsingsmetingen Met Optische Middelen", pp. 153-164.
Dissertation "Hock", 1975 pp. 130-131.

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