Position measurement method for measuring a position of an expos

Details Position measurement method for measuring a position of an expos Position measurement method for measuring a position of an expos

1997-06-18

1999-11-30

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Step and repeat

430 22, 355 77, G03B 2742, G03B 2732, G03F 900

Patent

active

059951990

ABSTRACT:
Positions of a plurality of marks formed in a correction mask are measured as first positions. A plurality of marks in the correction mask are transferred onto a photosensitive substrate, and transferred positions of the plurality of marks are determined as second positions. Subsequently, amounts of deviation of the first positions from the second positions are determined as correction data. After that, positions of a plurality of marks formed in an exposure mask are measured as third positions by a method similar to that used for measurement of the first positions, and the third positions are corrected on the basis of the correction data.

REFERENCES:
patent: 4962318 (1990-10-01), Nishi
patent: 5418613 (1995-05-01), Matsutani
patent: 5442418 (1995-08-01), Murakami et al.
patent: 5464715 (1995-11-01), Nishi et al.
patent: 5543256 (1996-08-01), Shinoda et al.
patent: 5751404 (1998-05-01), Murakami et al.
patent: 5753926 (1998-05-01), Sato
patent: 5773180 (1998-06-01), Tomimatu

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