Position measurement apparatus, imaging apparatus, exposure...

Details Position measurement apparatus, imaging apparatus, exposure... Position measurement apparatus, imaging apparatus, exposure...

2007-11-15

2009-02-24

Toatley, Jr., Gregory J (Department: 2877)

Optics: measuring and testing

Position or displacement

Position transverse to viewing axis

C356S614000, C356S400000, C356S401000

Reexamination Certificate

active

07495780

ABSTRACT:
An exposure apparatus performs a relative alignment between a reticle and a substrate, and exposes the substrate to light via a pattern formed on the reticle. The exposure apparatus includes a movable stage that carries one of the reticle and the substrate and a position measurement apparatus that measures a position of at least one of the reticle and the substrate. The position measurement apparatus includes an illumination unit configured to emit light toward a mark that indicates the position of the reticle or the substrate, a light intensity measurement unit configured to measure an intensity of the light, an imaging unit configured to capture an image of the mark, a stage position measurement unit configured to measure a position of the stage, and a signal waveform correction unit configured to correct a signal waveform output from the imaging unit based on a change in stage position and a change in illumination light intensity.

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patent: 2003-203839 (2003-07-01), None

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