Position determination method and lithographic apparatus

Details Position determination method and lithographic apparatus Position determination method and lithographic apparatus

2007-02-13

2007-02-13

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000

Reexamination Certificate

active

10954654

ABSTRACT:
An embodiment of the invention may be applied to measure the positions of features in a alignment region on a mask with a sensor. The positions of the features in the alignment region are known from the design. A feature of which the position is measured, is identified by comparing the relative positions between measured features with relative positions known from the design. The known position of the identified feature is subtracted from a measured position of the identified feature to give the position of the mask.

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patent: 2005-49580 (2005-02-01), None
patent: WO 2005/001593 (2005-06-01), None
patent: WO 2005/001593 (2005-06-01), None
“Matrix coding for optical identification of die”, Research Disclosure Database No. 467095 (Mar. 2003).

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