Position detection method and apparatus, and exposure method...

Details Position detection method and apparatus, and exposure method... Position detection method and apparatus, and exposure method...

2007-06-12

2007-06-12

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S124000, C355S053000, C355S055000, C250S548000

Reexamination Certificate

active

11102854

ABSTRACT:
A position detection apparatus for detecting a position of an object to be observed, including a position detection system, and an evaluation unit for measuring by the position detection system each of mark spacings between a plurality of alignment marks arranged on the object to be observed and evaluating measurement performance of the position detection system on the basis of mark spacing information obtained as the measurement result.

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Japanese Office Action dated Jun. 5, 2006, issued in corresponding Japanese patent application number 2001-266440.

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