Position detection method and apparatus

Details Position detection method and apparatus Position detection method and apparatus

2007-07-24

2007-07-24

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S492200, C250S494100, C382S294000, C378S034000

Reexamination Certificate

active

11194661

ABSTRACT:
An exposure method for projecting a pattern formed on a reflection plate onto a substrate, via a projection optical system, using extreme ultraviolet light. The method includes a detection step of detecting a relative position between a second mark formed on a plate holding unit for holding the reflection plate and a third mark formed on the reflection plate. The detection step includes sub-steps of (i) detecting light reflected from the second mark with a detector, (ii) detecting light reflected from the third mark with the detector, and (iii) changing a relative position between the plate holding unit and the detector between sub-steps (i) and (ii).

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