Position detection method and apparatus

Details Position detection method and apparatus Position detection method and apparatus

1990-08-03

1992-05-19

Turner, Samuel A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356400, 250548, G01B 902

Patent

active

051142368

ABSTRACT:
A position detecting method for detecting the position of a substrate by use of a grating pattern provided on the substrate includes irradiating the grating pattern with first and second radiation beams having different wavelengths to produce first and second diffraction beams of different wavelengths; and receiving the first and second diffraction beams by use of a sensor to determine the position of the substrate on the basis of the position of incidence of each of the first and second diffraction beams on the sensor.

REFERENCES:
patent: 4037969 (1977-07-01), Feldman et al.
patent: 4326805 (1982-04-01), Feldman et al.
patent: 4355892 (1982-10-01), Mayer et al.
patent: 4398824 (1983-08-01), Feldman et al.
patent: 4514858 (1985-04-01), Novak
patent: 4614432 (1986-09-01), Kuniyoshi et al.
patent: 4690529 (1987-09-01), Sugiyama et al.
patent: 4748333 (1988-05-01), Miztani et al.
patent: 4814829 (1989-03-01), Kosugi et al.
patent: 4857744 (1989-08-01), Kataoka et al.
patent: 4952970 (1990-08-01), Suzuki et al.
Feldman, et al., "Application of Zone Plates to Alignment in X-ray Lithography," Optical Engineering, vol. 22, No. 2 Mar.-Apr. 1983, pp. 203 through 207.

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