Position detection method and apparatus

Optics: measuring and testing – By alignment in lateral direction – With light detector

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356401, G01B 1100

Patent

active

046555986

ABSTRACT:
Position detecting method and a apparatus detect a position of substrate formed with a diffraction grating mark and a linearly extending stepped edge mark spaced from the diffraction grating. In the method and apparatus, those marks are relatively scanned by light beam, and position of the substrate is detected based on light information generated by both the marks and the scanning position.

REFERENCES:
patent: 4112309 (1978-09-01), Nakazawa et al.
patent: 4611122 (1986-09-01), Nakano et al.

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