Position detection mark and position detection method

Details Position detection mark and position detection method Position detection mark and position detection method

1996-03-08

1999-01-19

Dutton, Brian

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

438401, H01L 2166, H01L 2176, G01R 3126

Patent

active

058613200

ABSTRACT:
An exposure substrate includes a position detection mark having a recessed or projecting portion formed on the substrate with a difference h in depth. The difference h in depth of the recessed or projecting portion is set to

REFERENCES:
patent: 4780617 (1988-10-01), Umatate et al.
patent: 5432608 (1995-07-01), Komoriya et al.
patent: 5503962 (1996-04-01), Caldwell
Wittekoek et al., "Phase Gratings as Waferstepper Alignment Marks for All," Optical Microlithography IV, SPIE, vol.538, pp. 24-31, No Month 1985.

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