Optics: measuring and testing – By alignment in lateral direction
Reexamination Certificate
2007-01-30
2007-01-30
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
C356S401000, C356S614000, C355S077000, C430S022000, C430S030000
Reexamination Certificate
active
09343093
ABSTRACT:
An exposure apparatus includes an image sensing section and image sensing control section for measuring the average position of a mark formed on a wafer during a predetermined observation period before a stage completely stops, an interferometer for measuring any deviation of the stage during the observation period, a stage deviation storage section for storing the measurement result by the interferometer in a memory and calculating the average deviation of the stage on the basis of the measurement result, and a shift amount calculation section for calculating the actual position of the mark, while the stage is at rest, on the basis of the average position of the mark and the average deviation of the stage.
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European Search Report dated Mar. 5, 2002, issued in corresponding European patent appln. No. 99305100, forwarded in a communication dated Mar. 21, 2002.
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Stock, Jr. Gordon J.
Toatley , Jr. Gregory J.
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