Position detection apparatus, alignment apparatus and...

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

Reexamination Certificate

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Reexamination Certificate

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06870623

ABSTRACT:
A position detection apparatus for detecting a position of a pattern includes a first sensing system which senses a first image of the pattern at a first magnification, a second sensing system which senses a second image of the pattern at a second magnification higher than the first magnification, and a determination system which determines whether a relative position between the second sensing system and the pattern is valid for detecting a position of the pattern based on the first image sensed by the first sensing system.

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patent: 6335784 (2002-01-01), Mishima
patent: 6406820 (2002-06-01), Ota
patent: 6515296 (2003-02-01), Komatsu et al.

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