Position detecting method and device therefor as well as alignin

Optics: measuring and testing – By particle light scattering – With photocell detection

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356356, 356363, 250237G, G01B 902

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active

051826100

ABSTRACT:
The present invention relates to position detection, and aligning structure utilizing optical heterodyne method in semiconductor ultra fine processing or ultra accurate measuring. This is to provide a structure which contains pitches of not less than two kinds with respect to grating pitches of diffraction gratings which directly give influences to signal detecting range and detecting resolution, or which contains different values of not less than two kinds with respect to absolute values n of an order of .+-.n-th order injecting directions (or .+-.n-th order diffraction directions) to be determined by said grating pitches, so as to enable to enlarge a detecting range as maintaining a required detecting resolution (or a structure which can take out diffracted lights in different diffraction directions of not less than two).

REFERENCES:
patent: 5000573 (1991-03-01), Suzuki et al.
Itho et al., Proceeding of SPIE, vol. 773, Mar. 5, 1987, "A New Mask-to-Wafer Alignment Technique for Synchrotron Radiation X-ray Lithography", pp. 7-11.
Suzuki et al., J. Vac. Sci. Technol. B7(6), Nov./Dec. 1989, "An Optical-Heterodyne Alignment Technique for Quarter-Micron X-ray", pp. 1971-1976.
Ishihara et al., J. Vac. Sci. Technol. B7(6), Nov/Dec 1989, "A Vertical Stepper for Synchrotron X-ray Lithography", pp. 1652-1656.

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