Position detecting method and apparatus, exposure apparatus...

Details Position detecting method and apparatus, exposure apparatus... Position detecting method and apparatus, exposure apparatus...

2006-12-12

2006-12-12

Nguyen, Sang H. (Department: 2877)

Optics: measuring and testing

Position or displacement

Position transverse to viewing axis

C356S622000, C356S400000, C355S053000, C250S548000

Reexamination Certificate

active

07148973

ABSTRACT:
A method of determining relative position between a reflective reticle and a substrate includes a detection step of detecting relative position between a transmissive reference mark on a reticle stage and a substrate alignment mark on a substrate stage through a reflective optical system which projects a pattern of the reflective reticle onto the substrate with extreme ultraviolet light, and a determination step of determining relative position between the reflective reticle and the substrate based on the detection result in the detection step.

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European Search Report dated Feb. 13, 2006, issued in corresponding European patent application No. EP 02 25 3616, forwarded in a Communication dated Feb. 24, 2006.

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