Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1992-05-28
1993-08-10
Rosenberger, Richard A.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
250548, G01B 1100
Patent
active
052354083
ABSTRACT:
A device for detecting a positional relationship between a mask and a wafer, includes a light source for projecting light toward the mask, a first photodetecting system for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence on the first photodetecting system of the first light is changeable with the positional relationship between the mask and the wafer, a second photodetecting system for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence on the second photodetecting system, of the second light being changeable with relative inclination between the mask and the light source, and a position detecting system for detecting the relative position of the mask and the wafer on the basis of the detection by the first and second photodetecting systems, wherein the detection by the position detecting system can be free from the relative inclination between the mask and the light source.
REFERENCES:
patent: 4037969 (1977-07-01), Feldman et al.
patent: 4311389 (1982-01-01), Fay et al.
patent: 4326805 (1982-04-01), Feldman et al.
patent: 4514858 (1985-04-01), Novak
patent: 4815854 (1989-03-01), Tanaka et al.
patent: 5000573 (1991-03-01), Suzuki et al.
patent: 5114235 (1992-05-01), Suda et al.
Matsugu Masakazu
Saitoh Kenji
Suda Shigeyuki
Canon Kabushiki Kaisha
Pham Hoa Q.
Rosenberger Richard A.
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