Position detecting method and apparatus

Details Position detecting method and apparatus Position detecting method and apparatus

1992-05-29

1993-04-06

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, 355 53, G01B 1100

Patent

active

052008002

ABSTRACT:
A method of detecting a position of a substrate having an alignment mark includes the steps of projecting a radiation beam from an optical head to the alignment mark such that the alignment mark produces a signal beam on the basis of which the position of the substrate is detected, forming a reference mark on the substrate at a position different from that of the alignment mark, projecting a radiation beam from the optical head to the reference mark, such that the reference mark produces a reference beam, detecting the relative positional deviation of the optical head relative to the reference mark on the basis of the produced reference beam, and adjusting the relative position of the optical head and the alignment mark on the basis of the detected relative positional deviation and, after the adjustment, detecting the position of the substrate on the basis of the produced signal beam.

REFERENCES:
patent: 4037969 (1977-07-01), Feldman et al.
patent: 4311389 (1982-01-01), Fay et al.
patent: 4360273 (1982-11-01), Thaxter
patent: 4617469 (1986-10-01), Takahashi et al.
patent: 4655599 (1987-04-01), Ayata et al.
patent: 4853745 (1989-08-01), Kamiya et al.
patent: 4962423 (1990-10-01), Yamada et al.
patent: 5028797 (1991-07-01), Abe et al.
patent: 5114235 (1992-05-01), Suda et al.

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