Position detecting method

Details Position detecting method Position detecting method

1991-12-02

1995-03-07

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

053963350

ABSTRACT:
A method of detecting a positional deviation between a mask and a wafer, wherein a radiation beam having a predetermined intensity distribution is projected to an alignment pattern of the mask whereby a signal beam is produced, and wherein the positional deviation of the mask and the wafer is determined on the basis of the signal beam. The improvements reside in detecting a deviation of the position of incidence of the radiation beam upon the mask from a predetermined position, on the basis of the signal beam; relatively positioning the radiation beam and the mask so as to substantially correct the detected deviation; and determining the positional deviation of the mask and the wafer by using the relatively positioned radiation beam.

REFERENCES:
patent: 4037969 (1977-07-01), Feldman et al.
patent: 4311389 (1982-01-01), Fay et al.
patent: 4801808 (1989-01-01), Hamasaki
patent: 5026239 (1991-06-01), Chiba et al.
patent: 5114236 (1992-05-01), Matsugu et al.
patent: 5200800 (1993-04-01), Suda et al.

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