Position detecting method

Details Position detecting method Position detecting method

1991-07-22

1994-02-08

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

052852598

ABSTRACT:
A position detecting method is disclosed a radiation beam is projected to a grating pattern on a substrate, wherein a diffraction beam from the pattern and a reflectively scattered beam from an edge of a peripheral portion of the pattern are received by a sensor array and the position of the substrate is determined on the basis of a signal from the sensor array. On the sensor array, the diffraction beam and the reflectively scattered beam are substantially separated from each other. From a signal produced by the sensor array, a signal corresponding to the diffraction beam is extracted. The position of the substrate is determined on the basis of the extracted signal.

REFERENCES:
patent: 4704033 (1987-11-01), Fay et al.
patent: 4862318 (1990-10-01), Nishi

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