Position control method in exposure apparatus

Details Position control method in exposure apparatus Position control method in exposure apparatus

1999-02-26

2000-10-31

Kim, Robert

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356400, 250548, G01N 1100

Patent

active

061411086

ABSTRACT:
A method provides a technique for exposing a pattern on a mask that is held by a mask stage onto a substrate. The method includes a first step of detecting a mark on the mask that is held at a first position by the mask stage and determining a corresponding position of the mask stage; a second step of detecting the mark on the mask that is held at a second position different from the first position by the mask stage and determining a corresponding position of the mask stage; a third step of determining a position of the mask relative to the mask stage in accordance with the detection results in the first and second steps; a fourth step of aligning the mask with the substrate; and a fifth step of exposing the pattern on the mask onto the substrate.

REFERENCES:
patent: 5894350 (1999-04-01), Hsieh et al

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