Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-01-04
1984-07-17
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430189, 430191, 430192, 430302, 430326, G03C 160, G03C 154
Patent
active
044606745
ABSTRACT:
A posi-type photosensitive composition having enhanced sensitivity is prepared by incorporating a specific sensitizer selected from gallic acid, its derivative, naphthoquinone compound and its derivative in a quinonediazide type photosensitive material. The composition is free from lowering in development tolerance and other properties.
REFERENCES:
patent: 4115128 (1978-09-01), Kita
patent: 4174222 (1979-11-01), Komine et al.
Hamel, C. J. et al., IBM Technical Disclosure Bulletin, vol. 18, No. 6, 11/1975, p. 1775.
Aoki Tohru
Uehara Masafumi
Yamamoto Takeshi
Yamazaki Atsuo
Bowers Jr. Charles L.
Konishiroku Photo Industry Co,., Ltd.
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