Portable apparatus for thin deposition

Details Portable apparatus for thin deposition Portable apparatus for thin deposition

1999-02-08

2000-10-24

Beck, Shrive

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118723VE, 20429823, C23C 1600

Patent

active

061361674

ABSTRACT:
An apparatus for thin film deposition on fixed objects can be carried out using a portable vacuum deposition plant having a forechamber surrounding the deposition chamber and in which a process gas chamber slightly higher than that of the deposition chamber is maintained. The forechamber and the deposition chamber can be separately evacuated and vacuum seals can be provided between the chambers and the substrate. The source of the coating material may include a sputtering magnetron and a grid can be provided between the magnetron and the substrate.

REFERENCES:
patent: 4514275 (1985-04-01), Shimada et al.
patent: 4941915 (1990-07-01), Matsuoka et al.
patent: 4946576 (1990-08-01), Dietrich et al.
patent: 5372693 (1994-12-01), Brauer et al.

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