Port structure in semiconductor processing system

Details Port structure in semiconductor processing system Port structure in semiconductor processing system

2007-10-09

2007-10-09

Moore, Karla (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With means for passing discrete workpiece through plural...

C156S345330, C118S719000, C118S733000, C414S935000, C414S937000

Reexamination Certificate

active

10503940

ABSTRACT:
In a port structure16A in a semiconductor processing system2, a door20A is disposed in a port12A defined by upright wall52and54. A table48opposed to the port is disposed outside the system. Defined on the table is a mount region76for mounting an open type cassette18A for a process subject substrate W. A hood50is disposed rotatable relative to the table. The hood defines in its closed position a closed space surrounding the mount region and port, the space having a size to receive the cassette. First ventholes58are formed in the upright walls and/or the door so as to introduce gas from within the system into the closed space in the hood. Second ventholes72are formed in the table so as to discharge the gas can be discharged out of the closed space.

REFERENCES:
patent: 6318953 (2001-11-01), Bonora et al.
patent: 6409448 (2002-06-01), Sindledecker
patent: 10-56046 (1998-02-01), None
patent: 10-139155 (1998-05-01), None

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