Porous silicon oxynitride refractory shapes

Compositions: coating or plastic – Coating or plastic compositions – Metal-depositing composition or substrate-sensitizing...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

106 40R, 106 44, 106 69, 106 735, C04B 3558

Patent

active

040690580

ABSTRACT:
A porous refractory body is formed by bonding Si.sub.2 ON.sub.2 grain or other suitable refractory grain with fine crystals of Si.sub.2 ON.sub.2 formed in situ by firing a shaped body under nitridation conditions. The body has an open pore structure, is resistant to the constituents of an aluminum chloride electrolysis cell and has good structural strength.

REFERENCES:
patent: 3356513 (1967-12-01), Washburn
patent: 3639101 (1972-02-01), Washburn
patent: 3679444 (1972-07-01), Washburn
patent: 3785941 (1974-01-01), Jacobs

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Porous silicon oxynitride refractory shapes does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Porous silicon oxynitride refractory shapes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Porous silicon oxynitride refractory shapes will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2280870

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.