Electricity: electrical systems and devices – Electrolytic systems or devices – Solid electrolytic capacitor
Reexamination Certificate
2008-12-08
2011-11-08
Vortman, Anatoly (Department: 2835)
Electricity: electrical systems and devices
Electrolytic systems or devices
Solid electrolytic capacitor
C361S528000, C361S523000, C361S532000, C428S304400, C428S607000, C428S323000, C428S328000, C029S025030
Reexamination Certificate
active
08054611
ABSTRACT:
A porous metal thin film formed from aluminum has a film structure in which domains having an average diameter of 200 nm or more, and 500 nm or less and being formed through aggregation of a plurality of grains having an average grain diameter of 50 nm or more, and 160 nm or less are distributed discretely at an average distance of 5 nm or more, and 40 nm or less, wherein the area occupied by the above-described domains is 60% or more, and 90% or less in a cross-section in any direction of the porous metal thin film.
REFERENCES:
patent: 3293507 (1966-12-01), Smith
patent: 3427132 (1969-02-01), Goon
patent: 3466508 (1969-09-01), Booe
patent: 3723838 (1973-03-01), Kumagai
patent: 3828227 (1974-08-01), Millard et al.
patent: 3970903 (1976-07-01), Shirn
patent: 4090288 (1978-05-01), Thompson et al.
patent: 4203194 (1980-05-01), McGrath
patent: 4423004 (1983-12-01), Ross
patent: 4544403 (1985-10-01), Schiele et al.
patent: 4571664 (1986-02-01), Hyland
patent: 4660127 (1987-04-01), Gunter
patent: 4791532 (1988-12-01), Gouvernelle et al.
patent: 5410445 (1995-04-01), Kanetake
patent: 6238444 (2001-05-01), Cadwallader
patent: 6319292 (2001-11-01), Pozdeev-Freeman et al.
patent: 6432161 (2002-08-01), Oda et al.
patent: 6679934 (2004-01-01), Rao et al.
patent: 6786951 (2004-09-01), He et al.
patent: 6960237 (2005-11-01), Naito
patent: 6970345 (2005-11-01), Oh et al.
patent: 7066975 (2006-06-01), Oda et al.
patent: 7443653 (2008-10-01), Kim et al.
patent: 7473294 (2009-01-01), Oda et al.
patent: 7570480 (2009-08-01), Kim et al.
patent: 7666247 (2010-02-01), He et al.
patent: 7674401 (2010-03-01), Maruyama
patent: 7727508 (2010-06-01), Shi et al.
patent: 2002/0088507 (2002-07-01), Rao et al.
patent: 2002/0104404 (2002-08-01), Naito
patent: 2003/0218858 (2003-11-01), Kim et al.
patent: 2004/0066607 (2004-04-01), Edson et al.
patent: 2005/0088805 (2005-04-01), Edson et al.
patent: 2006/0260109 (2006-11-01), Vaisman et al.
patent: 2006/0262489 (2006-11-01), Vaisman et al.
patent: 2006/0275204 (2006-12-01), Tagusagawa et al.
patent: 2007/0068341 (2007-03-01), Cheng et al.
patent: 2007/0279841 (2007-12-01), Kim et al.
patent: 2008/0019081 (2008-01-01), Kim et al.
patent: 2008/0062617 (2008-03-01), Edson et al.
patent: 2008/0080124 (2008-04-01), Kim et al.
patent: 2009/0154065 (2009-06-01), Choi et al.
patent: 2009/0154066 (2009-06-01), Choi et al.
patent: 2009/0154068 (2009-06-01), Choi et al.
patent: 2010/0326239 (2010-12-01), Shi et al.
patent: 63-255910 (1988-10-01), None
patent: 01215959 (1989-08-01), None
patent: 10-270291 (1998-10-01), None
patent: 2000-299255 (2000-10-01), None
patent: 2006-108159 (2006-04-01), None
U.S. Appl. No. 12/325,673, filed Dec. 1, 2008, Mizuno.
(Kobe Steel, Ltd.)
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Vortman Anatoly
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