Porous films with chemical resistance

Details Porous films with chemical resistance Porous films with chemical resistance

2004-09-15

2010-11-09

Chang, Victor S (Department: 1783)

Stock material or miscellaneous articles

Web or sheet containing structurally defined element or...

Composite having voids in a component

C428S315500, C428S315700

Reexamination Certificate

active

07829186

ABSTRACT:
A porous film with chemical resistance of this invention includes a porous film base covered with a chemical-resistant polymeric compound and has a multiplicity of communicating micropores having an average pore size of 0.01 to 10 μm. The chemical-resistant polymeric compound can be, for example, any of phenolic resins, urea resins, melamine resins, benzoguanamine resins, polyimide resins, epoxy resins, benzoxazine resins, polypropylene resins, polyurethane resins, fluororesins, alkyd resins, cellulose acetate resins, phthalic resins, maleic resins, and silicone resins.

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English abstract of JP 2003-138057, see above for date and inventor.

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