Porous aluminas and their preparation

Chemistry of inorganic compounds – Oxygen or compound thereof – Metal containing

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423625, C01F 702

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active

047298901

ABSTRACT:
An alumina comprising particles which are aggregates or agglomerates of primary particles in which the internal porosity is provided by micropores of predetermined average width within the range 4 to 20 Angstroms and in which the pore width over the majority of the pores is within 1 Angstrom of the predetermined value, and a method for producing such an alumina by heating a particulate hydrous alumina to dehydrate it under an atmosphere in which the partial pressure of water vapor is maintained essentially constant at a predetermined value.

REFERENCES:
patent: 3417028 (1968-12-01), Montgomery
patent: 3436434 (1969-04-01), Lester
patent: 3669904 (1972-06-01), Corneliues
patent: 3773691 (1973-11-01), Leach
patent: 3974100 (1976-08-01), Kubicek
patent: 4010242 (1977-03-01), Iler et al.
patent: 4012337 (1977-03-01), Michell
patent: 4115248 (1978-09-01), Mulaskey
patent: 4117105 (1978-09-01), Hertzenberg et al.
patent: 4172809 (1979-10-01), Triki
patent: 4224302 (1980-09-01), Okamoto et al.
patent: 4267071 (1981-05-01), Jaffe
patent: 4301037 (1987-11-01), Sanchez et al.
patent: 4315839 (1982-02-01), Bouge et al.
Wefers et al, "Oxides and Hydroxides of Aluminum, Tech. Paper #19" Alcoa Research Labs., 1972, pp. 36-45, Table 14.

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