Polyvinyl ethers having silicon-containing functional groups...

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C526S279000, C526S332000

Reexamination Certificate

active

07425599

ABSTRACT:
Disclosed is a technology for the production of polyvinyl ethers having a reactive silicon-containing functional or atomic group at the terminal thereof. The polyvinyl ether as expressed by the formula (VII) is prepared by allowing, in the presence of a catalyst composed of a polynuclear ruthenium-carbonyl complex in which carbonyl groups coordinate with two to four ruthenium atoms, a vinylether compound expressed by the formula (III) to react with a silane compound expressed by the formula (IV). In the formulae, R1, R2and R3each represents a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms, R4represents an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, or a silyl group, and X1, X2and X3each represents a hydrogen atom, a halogen atom, an amino group, an alkyl group, an alkoxy group, a thioalkyl group, an alkylamino group, an aryl group, an arylamino group, an aralkyl group a vinyl group, or a heterocyclic group.

REFERENCES:
Crivello et al., J. Polym. Sci. A., 30 31-39 (1992).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Polyvinyl ethers having silicon-containing functional groups... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polyvinyl ethers having silicon-containing functional groups..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polyvinyl ethers having silicon-containing functional groups... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3981833

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.