Drug – bio-affecting and body treating compositions – Topical sun or radiation screening – or tanning preparations – Aromatic acid or derivative containing
Patent
1989-11-22
1991-11-12
Chan, Nicky
Drug, bio-affecting and body treating compositions
Topical sun or radiation screening, or tanning preparations
Aromatic acid or derivative containing
562100, 556120, 556 54, 556 27, A61K 744, C07C30919, C07F 700, C07F 980
Patent
active
050646419
ABSTRACT:
Polyvalent metal salt of a sulphonated derivative of benzylidenecamphor having the general formula: ##STR1## in which M.sup.n+ denotes a polyvalent metal cation in which n is equal to 2, 3 or 4; and
One of the symbols X.sub.1 or X.sub.2 denotes a hydrogen atom, the other denoting one of the following radicals Y.sub.1 Y.sub.2 : ##STR2## where M.sup.n+ has the same meaning as above. Cosmetic composition screening out UV rays of wavelengths 280-380 nm, containing the compound of formula (I) as well as, optionally, other sunscreens.
REFERENCES:
patent: 4165336 (1978-08-01), Bouillon et al.
patent: 4250108 (1981-02-01), Bouillon et al.
patent: 4304730 (1981-12-01), Bouillon et al.
patent: 4323549 (1982-04-01), Bouillon et al.
patent: 4327031 (1982-04-01), Bouillon et al.
patent: 4330488 (1982-05-01), Bouillon et al.
patent: 4421739 (1983-12-01), Bouillon et al.
patent: 4585597 (1986-04-01), Lang et al.
patent: 4654434 (1987-03-01), Lang et al.
patent: 4663088 (1987-05-01), Lang et al.
Liem et al., Intern. J. Cosmetic Science, 1, 341-361 (1979).
Forestier Serge
Lagrange Alain
Lang Gerard
Morie Claudine
"L'Oreal"
Chan Nicky
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