Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate
Reexamination Certificate
2005-01-25
2005-01-25
Zalukaeva, Tatyana (Department: 1713)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From phenol, phenol ether, or inorganic phenolate
C526S318200, C526S321000, C526S329500, C623S006110
Reexamination Certificate
active
06846900
ABSTRACT:
A compound favored with low viscosity, capable of providing a cured product having high refractive index, and suitable for application to optical materials, including plastic lens material, radical polymerizable flame retardant and the like, as well as a process for producing the compound, a plastic lens composition using the compound, a plastic lens obtained by curing the composition and a process for producing the plastic lens. A novel aromatic ring-containing polyvalent (meth)allyl ester derived from a polyvalent carboxylic acid of trivalent or greater valent is employed.
REFERENCES:
patent: 4701516 (1987-10-01), Rosenquist
patent: 5218067 (1993-06-01), Uchida et al.
patent: 5498751 (1996-03-01), Trapasso et al.
patent: 6545120 (2003-04-01), Ooga et al.
patent: 6586508 (2003-07-01), Ooga et al.
patent: 0 637 597 (1995-02-01), None
patent: WO 9917137 (1999-04-01), None
Database Crossfire Beilstein, Beilstein Institut zur Förderung der Chemischen Wissenschaften, Database accession No. 8230765 XP002203080, Abstract.
Kai Kazufumi
Ooga Kazuhiko
Tajima Tsuneo
Uchida Hiroshi
Showa Denko K.K.
Zalukaeva Tatyana
LandOfFree
POLYVALENT CARBOXYLIC ACID ESTER, PROCESS FOR PRODUCING THE... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with POLYVALENT CARBOXYLIC ACID ESTER, PROCESS FOR PRODUCING THE..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and POLYVALENT CARBOXYLIC ACID ESTER, PROCESS FOR PRODUCING THE... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3389722