Polyurethane urea polishing pad

Details Polyurethane urea polishing pad Polyurethane urea polishing pad

2007-11-06

2007-11-06

Nguyen, Dung Van (Department: 3723)

Abrading

Flexible-member tool, per se

Laminate

C451S056000

Reexamination Certificate

active

11489331

ABSTRACT:
The present invention relates to an article for altering a surface of a workpiece, or a polishing pad having a window. In particular, the polishing pad includes a polyurethane urea material wherein the polyurethane urea material contains cells which are at least partially filled with gas. The polyurethane urea material can be prepared by combining polyisocyanate and/or polyurethane prepolymer, hydroxyl-containing material, amine-containing material and blowing agent. The polishing pad according to the present invention is useful for polishing articles, and is especially useful for chemical mechanical polishing or planarization of microelectronic and optical electronic devices such as but not limited to semiconductor wafers. The window of the polishing pad is at least partially transparent and thus, can be particularly useful with polishing or planarizing tools that are equipped with through-the-platen wafer metrology.

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