Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent
1997-01-29
1999-10-12
Codd, Bernard
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
216 89, 522 96, 451526, 451 41, B24B 100
Patent
active
059654600
ABSTRACT:
Particular polyurethane photopolymers are disclosed as materials of construction in producing improved polishing pads. The polyurethane photopolymers are formed from a polyurethane prepolymer prepared from the reaction products of a first reactant selected from the group consisting of polyesters, polyethers, polybutadienes and mixtures of the foregoing with diisocyanates, further reacted with acrylates and/or methacrylates.
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Leach Douglas
Rach Joseph
Codd Bernard
Cordani John L.
Mac Dermid Incorporated
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