Polysulfide thermal vapour source for thin sulfide film...

Details Polysulfide thermal vapour source for thin sulfide film... Polysulfide thermal vapour source for thin sulfide film...

2004-10-06

2009-08-18

Meeks, Timothy H (Department: 1792)

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

C427S066000, C427S255290, C427S255310

Reexamination Certificate

active

07575775

ABSTRACT:
The present invention is a low pressure physical vapor deposition method for the deposition of multi element sulfide thin film phosphor compositions for electroluminescent devices where a thermal source comprising a polysulfide compound provides the source of sulfur species for phosphor film deposition and/or annealing. The method is particularly useful for the deposition of phosphors for full color ac electroluminescent displays employing thick film dielectric layers with a high dielectric constant.

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