Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1989-07-19
1990-10-23
Straub, Gary P.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423324, C01B 3320, C01B 1514
Patent
active
049650580
ABSTRACT:
Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH-- and --SiH.sub.2).sub.m O-- as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mols % or more) and oxygen (5 mol % or more).
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Arai Mikiro
Funayama Osamu
Isoda Takeshi
Nishii Hayato
Cuomo Lori F.
Meller Michael N.
Straub Gary P.
Toa Nenryo Kogyo Kabushiki Kaisha
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