Polysiloxanes having anionic carboxy, phosphonic or carboxy and

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428447, 524588, 528 25, 528 26, B32B 2734, B32B 904

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active

054665299

ABSTRACT:
A method is provided to impart stain resistance to a polyamide substrate, which method comprises contacting the substrate with an anionic polysiloxane selected from the group consisting of (A) a polysiloxane having at least one carboxy group, (B) a polysiloxane having at least one phosphonic acid group or a phosphonic salt group, (C) a polysiloxane having at least one carboxy group and at least one sulfonate group, and (D) a mixture of at least two of polysiloxanes (A), (B) and (C).

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