Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From silicon reactant having at least one...
Reexamination Certificate
2005-01-25
2005-01-25
Peng, Kuo-Liang (Department: 1712)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From silicon reactant having at least one...
C528S037000, C528S038000, C556S460000, C556S479000, C556S458000
Reexamination Certificate
active
06846895
ABSTRACT:
A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III),wherein A1and A2are an acid-dissociable monovalent organic group, R1is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.
REFERENCES:
patent: 5338640 (1994-08-01), Aoai et al.
patent: 5338818 (1994-08-01), Brunsvold et al.
patent: 5612170 (1997-03-01), Takemura et al.
patent: 6296985 (2001-10-01), Mizutani et al.
patent: 6531260 (2003-03-01), Iwasawa et al.
patent: 0 410 606 (1991-01-01), None
patent: 61-192709 (1986-08-01), None
Patent Abstracts of Japan vol. 016, No. 272 (P-1373), Jun. 18, 1992 and JP 04 070662 A (Nippon Telegr & Teleph Corp), Mar. 5, 1992, abstract only.
Patent Abstracts of Japan vol. 016, No. 445 (P-1422), Sep. 17, 1992 and JP 04 155344 A (Oki Electric Ind Co Ltd), May 28, 1992, abstract only.
Patent Abstracts of Japan vol. 018, No. 166 (P-1713), Mar. 18, 1994 and JP 05 333553 A (Oki Electric Ind Co Ltd), Dec. 17, 1993, abstract only.
Hayashi Akihiro
Iwasawa Haruo
Nishiyama Satoru
Shimokawa Tsutomu
JSR Corporation
Kelber Steven B.
Peng Kuo-Liang
Piper Rudnick LLP
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