Polysilicon resistor implanted with rare gas

Fishing – trapping – and vermin destroying

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357 59, 437 24, 437 27, 437 60, 437918, H01L 21265, H01L 2368

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active

049165070

ABSTRACT:
A method of fabricating a resistor in a polycrystalline semiconductor material includes rendering the material conductive by a heavy doping implantation of ions which are electrically active with respect to the material. Ions which are electrically inactive, for example, argon ions, are then implanted in an area of the material with a concentration that is controlled to form a resistor having a desired resistance value. The method permits the precise and accurate control of the fabrication of load resistors for logic circuits within a very wide resistance range, and the resulting resistance values are a linear function of the concentration of the inactive ions.

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patent: 4399451 (1983-08-01), Shirai
patent: 4416049 (1983-11-01), McElroy
patent: 4432008 (1984-02-01), Mattiel
"Minority Carrier Lifetime in Ion-Implanted and Annealed Silicon", Applied Physics, Letters, vol. 17, No. 3, pp. 107-109, Aug. 1, 1970; by D. Eirug Davies and S. A. Roosild.
"The Effect of Germanium Ion Implantation Dose on the Amorphization and Recrystallization of Polycrystalline Silicon Films", Journal of Applied Physics, vol. 52, No. 11, pp. 6655-6658, Nov. 1981; by Y. Komen.
Silicon Semiconductor Data, Pergamon Press, pp. 164-165 and 170-173, by Helmut F. Wolf.

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